Publicação
Study and optimization of materials to be used in the fabrication of HIT solar cells
| Resumo: | In this thesis, the fabrication processes of Heterojunction with Intrinsic Thin layer (HIT) solar cells were studied. The research began with the surface treatment of thin crystalline silicon n-type (100) 1-10 Ω/cm (120 μm) wafer. The successful removal of saw damage was achieved through a wet-etch process, employing a one- step treatment with 5 min at 45 ºC using 45% KOH. Furthermore, the RCA-1 and RCA-2 cleaning procedures were implemented. To evaluate the effectiveness of both processes, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), scanning electron microscopy (SEM) and photoluminescence spectroscopy (PL) were utilized. Subsequently, the optimization of the PECVD process for hydrogenated amorphous silicon thin films (a- Si:H) was conducted, focusing on both doped and intrinsic films. Various process conditions were investigated to understand their influence on the properties of the deposited films. Preferential deposition regimes were identified, leading to the development of a-Si:H films with desirable characteristics for solar cells. The films properties were analysed using spectroscopic ellipsometry and conductivity measurements. Furthermore, amorphous silicon p-i-n solar cells were fabricated as intermediary devices to validate the quality of the optimized films. Three batches of cells were fabricated, and their performance was evaluated through I-V measurements. The best-performing solar cell achieved a power conversion efficiency of 4.75%. This research was stepstone for the development of HIT solar cells for FLEXSOLAR project, within which this thesis was conducted. |
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| Autores principais: | Ferreira, Pedro Gil Amaral |
| Assunto: | Amorphous silicon p-i-n solar cells HIT solar cells surface treatments thin films PECVD hydrogenated amorphous silicon |
| Ano: | 2023 |
| País: | Portugal |
| Tipo de documento: | dissertação de mestrado |
| Tipo de acesso: | acesso aberto |
| Instituição associada: | Universidade Nova de Lisboa |
| Idioma: | inglês |
| Origem: | Repositório Institucional da UNL |
| Resumo: | In this thesis, the fabrication processes of Heterojunction with Intrinsic Thin layer (HIT) solar cells were studied. The research began with the surface treatment of thin crystalline silicon n-type (100) 1-10 Ω/cm (120 μm) wafer. The successful removal of saw damage was achieved through a wet-etch process, employing a one- step treatment with 5 min at 45 ºC using 45% KOH. Furthermore, the RCA-1 and RCA-2 cleaning procedures were implemented. To evaluate the effectiveness of both processes, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), scanning electron microscopy (SEM) and photoluminescence spectroscopy (PL) were utilized. Subsequently, the optimization of the PECVD process for hydrogenated amorphous silicon thin films (a- Si:H) was conducted, focusing on both doped and intrinsic films. Various process conditions were investigated to understand their influence on the properties of the deposited films. Preferential deposition regimes were identified, leading to the development of a-Si:H films with desirable characteristics for solar cells. The films properties were analysed using spectroscopic ellipsometry and conductivity measurements. Furthermore, amorphous silicon p-i-n solar cells were fabricated as intermediary devices to validate the quality of the optimized films. Three batches of cells were fabricated, and their performance was evaluated through I-V measurements. The best-performing solar cell achieved a power conversion efficiency of 4.75%. This research was stepstone for the development of HIT solar cells for FLEXSOLAR project, within which this thesis was conducted. |
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