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Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilms

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Detalhes bibliográficos
Resumo:Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
Autores principais:Getnet, Tsegaye Gashaw
Outros Autores:Silva, Gabriela F. da; Duarte, Iolanda S.; Kayama, Milton E.; Rangel, Elidiane C.; Cruz, Nilson C.
Assunto:dielectric barrier discharge carvacrol plasma polymerization biofilm inhibition
Ano:2020
País:Brasil
Tipo de documento:artigo
Tipo de acesso:acesso aberto
Instituição associada:IBICT
Idioma:inglês
Origem:Oasisbr
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author Getnet, Tsegaye Gashaw
author2 Silva, Gabriela F. da
Duarte, Iolanda S.
Kayama, Milton E.
Rangel, Elidiane C.
Cruz, Nilson C.
author2_role author
author
author
author
author
author_facet Getnet, Tsegaye Gashaw
Silva, Gabriela F. da
Duarte, Iolanda S.
Kayama, Milton E.
Rangel, Elidiane C.
Cruz, Nilson C.
author_role author
country_str BR
creators_json_txt [{\"Person.name\":\"Getnet, Tsegaye Gashaw\"},{\"Person.name\":\"Silva, Gabriela F. da\"},{\"Person.name\":\"Duarte, Iolanda S.\"},{\"Person.name\":\"Kayama, Milton E.\"},{\"Person.name\":\"Rangel, Elidiane C.\"},{\"Person.name\":\"Cruz, Nilson C.\"}]
datacite.creators.creator.creatorName.fl_str_mv Getnet, Tsegaye Gashaw
Silva, Gabriela F. da
Duarte, Iolanda S.
Kayama, Milton E.
Rangel, Elidiane C.
Cruz, Nilson C.
datacite.date.Accepted.fl_str_mv 2020-07-01T00:00:00Z
datacite.date.available.fl_str_mv 2020-12-11T23:14:08Z
datacite.date.embargoed.fl_str_mv 2020-12-11T23:14:08Z
datacite.rights.fl_str_mv http://purl.org/coar/access_right/c_abf2
datacite.subjects.subject.fl_str_mv dielectric barrier discharge
carvacrol plasma polymerization
biofilm inhibition
datacite.titles.title.fl_str_mv Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilms
dc.creator.none.fl_str_mv Getnet, Tsegaye Gashaw
Silva, Gabriela F. da
Duarte, Iolanda S.
Kayama, Milton E.
Rangel, Elidiane C.
Cruz, Nilson C.
dc.date.Accepted.fl_str_mv 2020-07-01T00:00:00Z
dc.date.available.fl_str_mv 2020-12-11T23:14:08Z
dc.date.embargoed.fl_str_mv 2020-12-11T23:14:08Z
dc.description.none.fl_str_mv Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)
Processo FAPESP: 190896/2015-9
Processo FAPESP: 302992/2017-0
In this paper, we have investigated the deposition of thin films from natural carvacrol extract using dielectric barrier discharge (DBD) plasma polymerization, aiming at the inhibition of bacteria adhesion and proliferation. The films deposited on stainless steel samples have been characterized by scanning electron microscopy, infrared reflectance-absorbance spectroscopy, profilometry, and contact angle measurements. Films with thicknesses ranging from 1.5 mu m to 3.5 mu m presented a chemical structure similar to that of carvacrol. While the formation of biofilm was observed on untreated samples, the coating completely inhibited the adhesion ofE. coliand reduced the adhesion ofS. aureusbiofilm in more than 90%.
dc.format.none.fl_str_mv 11
dc.identifier.none.fl_str_mv http://hdl.handle.net/11449/197882
dc.language.none.fl_str_mv eng
dc.publisher.none.fl_str_mv Mdpi
dc.rights.none.fl_str_mv http://purl.org/coar/access_right/c_abf2
dc.source.none.fl_str_mv reponame:Repositório Institucional da UNESP
instname:Universidade Estadual Paulista (UNESP)
instacron:UNESP
dc.subject.none.fl_str_mv dielectric barrier discharge
carvacrol plasma polymerization
biofilm inhibition
dc.title.fl_str_mv Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilms
dc.type.none.fl_str_mv http://purl.org/coar/resource_type/c_6501
description Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)
dirty 0
eu_rights_str_mv openAccess
format article
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identifier.url.fl_str_mv http://hdl.handle.net/11449/197882
inst_facet_str urn:organizationAcronym:oasisbr{{{_:::_}}}IBICT
instacron_str OASISBR
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instname_str IBICT
language eng
network_acronym_str oasisbr
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oai_identifier_str oai:repositorio.unesp.br:11449/197882
organization_str_mv urn:organizationAcronym:oasisbr
person_str_mv Getnet, Tsegaye Gashaw
Silva, Gabriela F. da
Duarte, Iolanda S.
Kayama, Milton E.
Rangel, Elidiane C.
Cruz, Nilson C.
publishDate 2020
publisher.none.fl_str_mv Mdpi
repo_facet_str urn:repositoryAcronym:oasisbr{{{_:::_}}}Oasisbr
reponame_str Oasisbr
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spelling Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilmsGetnet, Tsegaye GashawSilva, Gabriela F. daDuarte, Iolanda S.Kayama, Milton E.Rangel, Elidiane C.Cruz, Nilson C.dielectric barrier dischargecarvacrol plasma polymerizationbiofilm inhibitionopen accesshttp://purl.org/coar/access_right/c_abf2http://hdl.handle.net/11449/197882HandleMaterials. Basel: Mdpi, v. 13, n. 14, 11 p., 2020.N/AHasVersionWOS:000558034400001N/AHasVersionhttps://doi.org/http://dx.doi.org/10.3390/ma13143166DOIhttp://hdl.handle.net/11449/197882Handlehttps://doi.org/10.3390/ma13143166DOI2020-12-11T23:14:08Z2020-12-112020-07-01T00:00:00ZConselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq)Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP)Processo FAPESP: 190896/2015-9Processo FAPESP: 302992/2017-0In this paper, we have investigated the deposition of thin films from natural carvacrol extract using dielectric barrier discharge (DBD) plasma polymerization, aiming at the inhibition of bacteria adhesion and proliferation. The films deposited on stainless steel samples have been characterized by scanning electron microscopy, infrared reflectance-absorbance spectroscopy, profilometry, and contact angle measurements. Films with thicknesses ranging from 1.5 mu m to 3.5 mu m presented a chemical structure similar to that of carvacrol. While the formation of biofilm was observed on untreated samples, the coating completely inhibited the adhesion ofE. coliand reduced the adhesion ofS. aureusbiofilm in more than 90%.eng11Mdpireponame:Repositório Institucional da UNESPinstname:Universidade Estadual Paulista (UNESP)instacron:UNESPjournal articlehttp://purl.org/coar/resource_type/c_6501literatureVoRhttp://purl.org/coar/version/c_970fb48d4fbd8a85
spellingShingle Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilms
Getnet, Tsegaye Gashaw
dielectric barrier discharge
carvacrol plasma polymerization
biofilm inhibition
status SINGLETON
status_str VoR
subject.fl_str_mv dielectric barrier discharge
carvacrol plasma polymerization
biofilm inhibition
title Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilms
title_full Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilms
title_fullStr Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilms
title_full_unstemmed Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilms
title_short Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilms
title_sort Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilms
topic dielectric barrier discharge
carvacrol plasma polymerization
biofilm inhibition
topic_facet dielectric barrier discharge
carvacrol plasma polymerization
biofilm inhibition
url http://hdl.handle.net/11449/197882
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