Getnet, T. G., Silva, G. F. d., Duarte, I. S., Kayama, M. E., Rangel, E. C., & Cruz, N. C. (2020). Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation ofE. ColiandS. AureusBiofilms.
Citação norma ChicagoGetnet, Tsegaye Gashaw, Gabriela F. da Silva, Iolanda S. Duarte, Milton E. Kayama, Elidiane C. Rangel, and Nilson C. Cruz. Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation OfE. ColiandS. AureusBiofilms. 2020.
Citação norma MLAGetnet, Tsegaye Gashaw, et al. Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation OfE. ColiandS. AureusBiofilms. 2020.