This paper introduces the general editorial policy of i-ETC, a new online Open Access Journal. The publication of this academic journal is based on the software Open Journal System and it is maintained by the Department of Electronics, Telecommunications and Computer Engineering (DEETC), at the High Institute of Engineering of Lisbon (ISEL) in Lisbon.

This work reports the design of a 1x2 photonic digital switch controlled by an electrically induced metasurface, configurated by a rectangular array of points where the refractive index is locally changed through the application of an external bias. The device is simulated using the Beam Propagation Method (BPM) and Finite Difference Time Domain (FDTD) algorithms and the structure under evaluation is an amorphous silicon 1x2 multimode interference (MMI), joined to an arrayed Metal Oxide Semiconductor (MOS) structure Al/SiNx/a-Si:H/ITO to be used in active-matrix pixel fashion to control the output of the switch. MMI couplers, based on self-imaging multimode waveguides, are very compact integrated optical components that can perform many different splitting and recombining functions. The input–output model has been defined using a machine learning approach; a high number of images have been generated through simulations, based on the beam propagation algorithm, obtaining a large dataset for an MMI structure under different activation maps of the MOS pixels. This dataset has been used for training and testing of a machine learning algorithm for the classification of the MMI configuration in terms of binary digital output for a 1x2 switch. Also, a statistical analysis has been produced, targeting the definition of the most incident-activated pixel for each switch operation. An optimal configuration is proposed and applied to demonstrate the operation of a digital cascaded switch. This proof of concept paves the way to a more complex device class, supporting the recent advances in programmable photonic integrated circuits.

We present measurements and numerical simulation of a-Si:H p-i-n detectors with a wide range of intrinsic layer thickness between 2 and 10 pm. Such a large active layer thickness is required in applications like elementary particle detectors or X-ray detectors. For large thickness and depending on the applied bias, we observe a sharp peak in the spectral response in the red region near 700 nm. Simulation results obtained with the program ASCA are in agreement with the measurement and permit the explanation of the experimental data. In thick samples holes recombine or are trapped before reaching the contacts, and the conduction mechanism is fully electron dominated. As a consequence, the peak position in the spectral response is located near the optical band gap of the a-Si:H i-layer. (C) 2009 Elsevier B.V. All rights reserved.

The development and realization of a plasmonic structure based on the LSP interaction of metal nanoparticles with an embedding matrix of amorphous silicon is proposed. As a planned application, this structure will need to be usable as the basis for a sensor device applied in biomedical applications, after proper functionalization with selective antibodies. The final sensor structure needs to be low-cost, compact, and disposable. The study reported in this paper aims to analyze varied materials for nanoparticles embedded in an amorphous silico matrix. Metals of interest for nanoparticles composition are aluminum and gold. As a comparison term, a non-plasmonic material like alumina, resulting from oxidation of Al nanoparticles, is also considered. As a preliminary approach to this device, we study in this work the optical properties of spherical metal nanoparticles embedded in an amorphous silicon matrix, as a function of size and metal type. Following an analysis based on the exact solution of the Mie theory, experimental measurements realized with arrays of metal nanoparticles are compared with the simulations.

Amorphous silicon PECVD photonic integrated devices are promising candidates for low cost sensing applications. This manuscript reports a simulation analysis about the impact on the overall efficiency caused by the lithography imperfections in the deposition process. The tolerance to the fabrication defects of a photonic sensor based on surface plasmonic resonance is analysed. The simulations are performed with FDTD and BPM algorithms. The device is a plasmonic interferometer composed by an a-Si:H waveguide covered by a thin gold layer. The sensing analysis is performed by equally splitting the input light into two arms, allowing the sensor to be calibrated by its reference arm. Two different 1 × 2 power splitter configurations are presented: a directional coupler and a multimode interference splitter. The waveguide sidewall roughness is considered as the major negative effect caused by deposition imperfections. The simulation results show that plasmonic effects can be excited in the interferometric waveguide structure, allowing a sensing device with enough sensitivity to support the functioning of a bio sensor for high throughput screening. In addition, the good tolerance to the waveguide wall roughness, points out the PECVD deposition technique as reliable method for the overall sensor system to be produced in a low-cost system. The large area deposition of photonics structures, allowed by the PECVD method, can be explored to design a multiplexed system for analysis of multiple biomarkers to further increase the tolerance to fabrication defects.

Microcrystalline silicon is a two-phase material. Its composition can be interpreted as a series of grains of crystalline silicon imbedded in an amorphous silicon tissue, with a high concentration of dangling bonds in the transition regions. In this paper, results for the transport properties of a mu c-Si:H p-i-n junction obtained by means of two-dimensional numerical simulation are reported. The role played by the boundary regions between the crystalline grains and the amorphous matrix is taken into account and these regions are treated similar to a heterojunction interface. The device is analysed under AM1.5 illumination and the paper outlines the influence of the local electric field at the grain boundary transition regions on the internal electric configuration of the device and on the transport mechanism within the mu c-Si:H intrinsic layer.

In this work we present a simulation study about the characteristics of a semiconductor structure suitable to be used as a guided wave optical biosensor, based on Surface Plasmonic Resonance effects (SPR). The proposed structure is a planar metal-dielectric waveguide where the sensor operation is based on the coupling between the fundamental propagation TM mode and the surface plasmon excited at the outer boundary of the metal, which interfaces the sample medium. Gold and aluminum are the metals considered for the plasmonic coating, amorphous silicon and others PECVD materials are considered for the waveguide structure. The results are based on modal analysis of the waveguide and plasmonic modes. The results obtained point out the possibility of generating SPPs in the near infrared range by including a functionalized cover of reduced graphene oxide (rGO) over the metal layer.

This paper presents an analysis of the material quality influence for amorphous silicon waveguides for microphotonic applications. Material quality is taken into account by a model based on the absorption coefficient data obtained by Constant Photocurrent Measurement (CPM) in the near infrared region. The GUTL (Gauss-Urbach-Tauc-Lorentz) model has been presented as an extension of the standard Urbach-Tauc-Lorentz model and proposed as a predictor for the wavelength dependent optical constants of amorphous silicon in the near infrared spectra. Values produced for the GUTL model have been used as input for a set of FDTD simulations, taking in consideration different material qualities and waveguide dimensions directed to study the characteristics of amorphous silicon waveguides embedded in a SiO2 cladding.

CETC 2013 is a premier conference in the broad field of Electronics, Telecommunications and Computers. The aim of the conference is to provide a platform for engineers to disseminate and discuss their current research findings and also to explore recent development, current practices and future trends in Electronics, Telecommunications and Computers. We also encourage the dissemination of R&D linked to the Industry. The conference program includes sessions with invited speakers and breakout sessions with oral and poster presentations in the fields of Electronics, Telecommunications, and Computers.

This work deals with the production of a low-cost disposable biosensor for point of care applications. The proposed sensor is a plasmonic structure based on the Localized Surface Plasmon Resonance (LSPR) interaction of metal nanoparticles (MNPs), embedded into a matrix of reduced Graphene Oxide (rGO). After proper functionalization with selective antibodies (Ab), the efficiency of light extinction is controlled by slight changes of the refractive coefficient induced by the concentration of biomarkers trapped by the antibodies on the sensor surface. This work reports a study about the applicability of rGO as a support for gold nanoparticles (AuNPs) for preparing the functionalized LSPR sensing layer. AuNPs are prepared with an economic and eco-friendly method using phytochemicals present in tea extract at room temperature, while a modified Hummer’s method is used to synthesize rGO. The resulting AuNPs-rGO composites are studied in terms of UV-VIS spectroscopy spectral light transmission and plasmonic resonance. The overall analysis is supported by simulation results, obtained by Mie analysis, about the LSPR effect in AuNPs-rGO and its dependence on the biomarker concentration.